1. Post-metallization annealing and photolithography effects in p-type Ge/Al2O3/Al MOS structures. (1st April 2022) Authors: Ioannou-Sougleridis, V.; Alafakis, S.; Pécz, B.; Velessiotis, D.; Vouroutzis, N. Z.; Ladas, S.; Barozzi, M.; Pepponi, G.; Skarlatos, D. Journal: ECS journal of solid state science and technology Issue: Volume 11:Number 4(2022) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗