1. Plasma column position measurements using magnetic diagnostics in ADITYA-U tokamak. (28th September 2021) Authors: Aich, S; Kumar, R; Macwan, T M; Kumavat, D; Jha, S; Tanna, R L; Sathyanarayana, K; Ghosh, J; Jadeja, K A; Patel, K; Patel, Sharvil; Ranjan, Vaibhav; Kalal, Madanlal; Varia, Dinesh; Sadharkiya, D; Raju, D; Chattopadhyay, P K; Gupta, C N; Saxena, Y C Other Names: collab. Journal: Plasma research express Issue: Volume 3:Number 3(2021) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Role of substrate bias during deposition of magnetron sputtered Ni, Ti and Ni-Ti thin films. (1st October 2013) Authors: Priyadarshini, B G; Kumar Gupta, M; Ghosh, S; Chakraborty, M; Aich, S Journal: Surface engineering Issue: Volume 29:Number 9(2013) Page Start: 689 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. Role of substrate bias during deposition of magnetron sputtered Ni, Ti and Ni–Ti thin films. (October 2013) Authors: Priyadarshini, B G; Kumar Gupta, M; Ghosh, S; Chakraborty, M; Aich, S Journal: Surface engineering Issue: Volume 29:Number 9(2013) Page Start: 689 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗